Product
ITO Target
Characteristic
Our company realizes high density of various shapes and sizes by our own slurry forming technology (flat plate type - MMF method) (cylindrical type -CIP method). We promise to reduce nodules and particles when using. We can also provide customized products suitable for customer's needs even for touch panel applications which can not heat treatment after film formation.
IGZO Target
Characteristic
IGZO which attracts much attention in oxide semiconductor applications that realize high definition and low power consumption of small- and medium-sized FPD panels. We can offer large-sized products effective for reducing nodules, particles etc., and targets of various compositions.
New shape - Cylindrical Target
Characteristic
The shape of the target has been generally planar (flat plate) type, but as sputtering equipment has made it possible to adopt the target of rotary type (cylindrical type) in recent years, our company also mass-produced quickly, the customer's process It contributes to improvement etc.
Other Products
Characteristic
In addition, we will develop and manufacture all targets that meet customers' needs in solar cells, building materials, semiconductors and other applications. Please contact us for materials not listed on the website.