Abrasive・Ta/Nb
The Rare Material Division handles rare metal products such as high-purity tantalum for SAW filters, cerium-based abrasives for glass polishing of liquid crystal panels and hard disks, and NANOBIXTM for polishing SiC semiconductors.
Cerium oxide abrasive
MIREKTM
This abrasive is based on cerium oxide, and it is used in advanced field of the electronic and optical industry to polish glass substrate, hard disk, photomask, and optical glass.
MIREKTM
Abrasive for SiC
NANOBIXTM
Since silicon carbide (SiC) single crystal is receiving attention as a material for many power devices. However, it is extremely hard and requires considerable skill and time to smoothen the surface down to the atom level.
We have succeeded in developing an abrasive that can quickly smoothen silicon carbide to utilize our time-proven technology for developing abrasives.
NANOBIXTM
Tantalum / Niobium
Tantalum Oxide・Niobium Oxide・Niobium Hydroxide（Ta2O5・Nb2O5・Nb(OH)5）
To produce high purity oxide products, many kind of raw materials are separated and refined using solvent extraction equipment.
Their applications are optical lens, electric ceramics, and single crystal, etc.
Tantalum Oxide・Niobium Oxide・Niobium Hydroxide
Tantalum Carbide・Niobium Carbide（TaC・NbC・TaNbC）
Our tantalum and niobium carbides that are made from our oxides are manufactured by carbonizing processes.
These are supplied for raw materials of cemented carbide and PCB drills.
Tantalum Carbide・Niobium Carbide
